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Hyper-FET's Phase-Transition-Materials Design Guidelines for Ultra-Low Power Applications at 3 nm Technology Node.
Nanomaterials (Basel). 2022 Nov 21;12(22):4096. doi: 10.3390/nano12224096.
Nanomaterials (Basel). 2022.
PMID: 36432381
Free PMC article.
Vertical Gate-All-Around Device Architecture to Improve the Device Performance for Sub-5-nm Technology.
Noh C, Han C, Won SM, Shin C.
Noh C, et al.
Micromachines (Basel). 2022 Sep 19;13(9):1551. doi: 10.3390/mi13091551.
Micromachines (Basel). 2022.
PMID: 36144174
Free PMC article.
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Simulation Study: The Impact of Structural Variations on the Characteristics of a Buried-Channel-Array Transistor (BCAT) in DRAM.
Sun M, Baac HW, Shin C.
Sun M, et al.
Micromachines (Basel). 2022 Sep 5;13(9):1476. doi: 10.3390/mi13091476.
Micromachines (Basel). 2022.
PMID: 36144099
Free PMC article.
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Impact of Stacking-Up and Scaling-Down Bit Cells in 3D NAND on Their Threshold Voltages.
Lee D, Shin C.
Lee D, et al.
Micromachines (Basel). 2022 Jul 18;13(7):1139. doi: 10.3390/mi13071139.
Micromachines (Basel). 2022.
PMID: 35888955
Free PMC article.
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Device and Circuit Analysis of Double Gate Field Effect Transistor with Mono-Layer WS2-Channel at Sub-2 nm Technology Node.
Park J, Ra C, Lim J, Jeon J.
Park J, et al.
Nanomaterials (Basel). 2022 Jul 4;12(13):2299. doi: 10.3390/nano12132299.
Nanomaterials (Basel). 2022.
PMID: 35808135
Free PMC article.
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Impact of Chamber/Annealing Temperature on the Endurance Characteristic of Zr:HfO2 Ferroelectric Capacitor.
Choi Y, Han C, Shin J, Moon S, Min J, Park H, Eom D, Lee J, Shin C.
Choi Y, et al.
Sensors (Basel). 2022 May 27;22(11):4087. doi: 10.3390/s22114087.
Sensors (Basel). 2022.
PMID: 35684705
Free PMC article.
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