Tünnermann A - Search Results

1

Plasma-etched organic layers for antireflection purposes.

Schulz U, Präfke C, Gödeker C, Kaiser N, Tünnermann A. Schulz U, et al. Among authors: tunnermann a. Appl Opt. 2011 Mar 20;50(9):C31-5. doi: 10.1364/AO.50.000C31. Appl Opt. 2011. PMID: 21460957

2

Stochastic subwavelength structures on poly(methyl methacrylate) surfaces for antireflection generated by plasma treatment.

Leitel R, Schulz U, Kaiser N, Tünnermann A. Leitel R, et al. Among authors: tunnermann a. Appl Opt. 2008 May 1;47(13):C143-6. doi: 10.1364/ao.47.00c143. Appl Opt. 2008. PMID: 18449236

3

Optical and structural properties of LaF3 thin films.

Bischoff M, Gäbler D, Kaiser N, Chuvilin A, Kaiser U, Tünnermann A. Bischoff M, et al. Among authors: tunnermann a. Appl Opt. 2008 May 1;47(13):C157-61. doi: 10.1364/ao.47.00c157. Appl Opt. 2008. PMID: 18449239

4

Low temperature deposition of indium tin oxide films by plasma ion-assisted evaporation.

Füchsel K, Schulz U, Kaiser N, Tünnermann A. Füchsel K, et al. Among authors: tunnermann a. Appl Opt. 2008 May 1;47(13):C297-302. doi: 10.1364/ao.47.00c297. Appl Opt. 2008. PMID: 18449263

5

Extreme-ultraviolet-induced oxidation of Mo/Si multilayers.

Benoit N, Schröder S, Yulin S, Feigl T, Duparré A, Kaiser N, Tünnermann A. Benoit N, et al. Among authors: tunnermann a. Appl Opt. 2008 Jul 1;47(19):3455-62. doi: 10.1364/ao.47.003455. Appl Opt. 2008. PMID: 18594592

6

Antireflection of transparent polymers by advanced plasma etching procedures.

Schulz U, Munzert P, Leitel R, Wendling I, Kaiser N, Tünnermann A. Schulz U, et al. Among authors: tunnermann a. Opt Express. 2007 Oct 1;15(20):13108-13. doi: 10.1364/oe.15.013108. Opt Express. 2007. PMID: 19550578 Free article.

7

Mixed oxide coatings for optics.

Stenzel O, Wilbrandt S, Schürmann M, Kaiser N, Ehlers H, Mende M, Ristau D, Bruns S, Vergöhl M, Stolze M, Held M, Niederwald H, Koch T, Riggers W, Burdack P, Mark G, Schäfer R, Mewes S, Bischoff M, Arntzen M, Eisenkrämer F, Lappschies M, Jakobs S, Koch S, Baumgarten B, Tünnermann A. Stenzel O, et al. Among authors: tunnermann a. Appl Opt. 2011 Mar 20;50(9):C69-74. doi: 10.1364/AO.50.000C69. Appl Opt. 2011. PMID: 21460985

8

Manufacture and characterization of optical coatings with incorporated copper island films.

Held M, Stenzel O, Wilbrandt S, Kaiser N, Tünnermann A. Held M, et al. Among authors: tunnermann a. Appl Opt. 2012 Jul 1;51(19):4436-47. doi: 10.1364/AO.51.004436. Appl Opt. 2012. PMID: 22772117

9

La/B(4)C multilayer mirrors with an additional wavelength suppression.

Naujok P, Yulin S, Bianco A, Mahne N, Kaiser N, Tünnermann A. Naujok P, et al. Among authors: tunnermann a. Opt Express. 2015 Feb 23;23(4):4289-95. doi: 10.1364/OE.23.004289. Opt Express. 2015. PMID: 25836465 Free article.

10

Estimation of the composition of coelectron-beam-evaporated thin-mixture films by making use of the Wiener bounds.

Franke C, Stenzel O, Wilbrandt S, Wolf J, Kaiser N, Tünnermann A. Franke C, et al. Among authors: tunnermann a. Appl Opt. 2015 Mar 20;54(9):2362-70. doi: 10.1364/AO.54.002362. Appl Opt. 2015. PMID: 25968522

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