Plasma-etched organic layers for antireflection purposes

Appl Opt. 2011 Mar 20;50(9):C31-5. doi: 10.1364/AO.50.000C31.

Abstract

Organic layers can be used to realize special functions in optical interference coatings. Suitable compounds for such layers were thermally evaporated and characterized. A plasma etching procedure was applied to produce nanostructures on top of the organic layers to reduce their effective refractive indices. Broadband antireflective coatings were obtained by combining these artificial low-index layers with conventionally prepared interference stacks.