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Atomic Layer Deposition of Layered Boron Nitride for Large-Area 2D Electronics.
Lee J, Ravichandran AV, Mohan J, Cheng L, Lucero AT, Zhu H, Che Z, Catalano M, Kim MJ, Wallace RM, Venugopal A, Choi W, Colombo L, Kim J. Lee J, et al. Among authors: kim j, kim mj. ACS Appl Mater Interfaces. 2020 Aug 12;12(32):36688-36694. doi: 10.1021/acsami.0c07548. Epub 2020 Jul 29. ACS Appl Mater Interfaces. 2020. PMID: 32667778
Low Temperature Thermal Atomic Layer Deposition of Aluminum Nitride Using Hydrazine as the Nitrogen Source.
Jung YC, Hwang SM, Le DN, Kondusamy ALN, Mohan J, Kim SW, Kim JH, Lucero AT, Ravichandran A, Kim HS, Kim SJ, Choi R, Ahn J, Alvarez D, Spiegelman J, Kim J. Jung YC, et al. Among authors: kim sw, kim sj, kim hs, kim j, kim jh. Materials (Basel). 2020 Jul 31;13(15):3387. doi: 10.3390/ma13153387. Materials (Basel). 2020. PMID: 32751836 Free PMC article.
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