Selective etching of silicon nitride over silicon oxide using ClF3/H2 remote plasma.
Lee WO, Kim KH, Kim DS, Ji YJ, Kang JE, Tak HW, Park JW, Song HD, Kim KS, Cho BO, Kim YL, Yeom GY.
Lee WO, et al. Among authors: kim ds, kim yl, kim ks, kim kh.
Sci Rep. 2022 Apr 5;12(1):5703. doi: 10.1038/s41598-022-09252-3.
Sci Rep. 2022.
PMID: 35383214
Free PMC article.