Kim BH - Search Results

1

High Performance Field-Effect Transistors Based on Partially Suspended 2D Materials via Block Copolymer Lithography.

Kim S, Lee SE, Park JH, Shin JY, Lee B, Lim HY, Oh YT, Hwang JP, Seon SW, Kim SH, Yu TS, Kim BH. Kim S, et al. Among authors: kim sh, kim bh. Polymers (Basel). 2021 Feb 14;13(4):566. doi: 10.3390/polym13040566. Polymers (Basel). 2021. PMID: 33672839 Free PMC article.

2

Hierarchical Self-Assembly of Thickness-Modulated Block Copolymer Thin Films for Controlling Nanodomain Orientations inside Bare Silicon Trenches.

Shin JY, Oh YT, Kim S, Lim HY, Lee B, Ko YC, Park S, Seon SW, Lee SG, Mun SS, Kim BH. Shin JY, et al. Among authors: kim s, kim bh. Polymers (Basel). 2021 Feb 13;13(4):553. doi: 10.3390/polym13040553. Polymers (Basel). 2021. PMID: 33668510 Free PMC article.

3

Mussel-inspired block copolymer lithography for low surface energy materials of teflon, graphene, and gold.

Kim BH, Lee DH, Kim JY, Shin DO, Jeong HY, Hong S, Yun JM, Koo CM, Lee H, Kim SO. Kim BH, et al. Among authors: kim jy, kim so. Adv Mater. 2011 Dec 15;23(47):5618-22. doi: 10.1002/adma.201103650. Epub 2011 Oct 21. Adv Mater. 2011. PMID: 22021119

4

Ultralarge-area block copolymer lithography enabled by disposable photoresist prepatterning.

Jeong SJ, Moon HS, Kim BH, Kim JY, Yu J, Lee S, Lee MG, Choi H, Kim SO. Jeong SJ, et al. Among authors: kim jy, kim bh, kim so. ACS Nano. 2010 Sep 28;4(9):5181-6. doi: 10.1021/nn101212q. ACS Nano. 2010. PMID: 20722433

5

Surface energy modification by spin-cast, large-area graphene film for block copolymer lithography.

Kim BH, Kim JY, Jeong SJ, Hwang JO, Lee DH, Shin DO, Choi SY, Kim SO. Kim BH, et al. Among authors: kim jy, kim so. ACS Nano. 2010 Sep 28;4(9):5464-70. doi: 10.1021/nn101491g. ACS Nano. 2010. PMID: 20738125

6

Negative-tone block copolymer lithography by in situ surface chemical modification.

Kim BH, Byeon KJ, Kim JY, Kim J, Jin HM, Cho JY, Jeong SJ, Shin J, Lee H, Kim SO. Kim BH, et al. Among authors: kim jy, kim j, kim so. Small. 2014 Oct 29;10(20):4207-12. doi: 10.1002/smll.201400971. Epub 2014 Jun 10. Small. 2014. PMID: 24912807

7

Ultralarge Area Sub-10 nm Plasmonic Nanogap Array by Block Copolymer Self-Assembly for Reliable High-Sensitivity SERS.

Jin HM, Kim JY, Heo M, Jeong SJ, Kim BH, Cha SK, Han KH, Kim JH, Yang GG, Shin J, Kim SO. Jin HM, et al. Among authors: kim jy, kim bh, kim so, kim jh. ACS Appl Mater Interfaces. 2018 Dec 26;10(51):44660-44667. doi: 10.1021/acsami.8b17325. Epub 2018 Dec 11. ACS Appl Mater Interfaces. 2018. PMID: 30480431

8

Functional bio-inspired hybrid fliers with separated ring and leading edge vortices.

Kim JT, Yoon HJ, Cheng S, Liu F, Kang S, Paudel S, Cho D, Luan H, Lee M, Jeong G, Park J, Huang YT, Lee SE, Cho M, Lee G, Han M, Kim BH, Yan J, Park Y, Jung S, Chamorro LP, Rogers JA. Kim JT, et al. Among authors: kim bh. PNAS Nexus. 2024 Mar 11;3(3):pgae110. doi: 10.1093/pnasnexus/pgae110. eCollection 2024 Mar. PNAS Nexus. 2024. PMID: 38516273 Free PMC article.

9

Soft graphoepitaxy of block copolymer assembly with disposable photoresist confinement.

Jeong SJ, Kim JE, Moon HS, Kim BH, Kim SM, Kim JB, Kim SO. Jeong SJ, et al. Among authors: kim bh, kim jb, kim sm, kim je, kim so. Nano Lett. 2009 Jun;9(6):2300-5. doi: 10.1021/nl9004833. Nano Lett. 2009. PMID: 19507886

10

3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene.

Kim JY, Lim J, Jin HM, Kim BH, Jeong SJ, Choi DS, Li DJ, Kim SO. Kim JY, et al. Among authors: kim bh, kim so. Adv Mater. 2016 Feb 24;28(8):1591-6. doi: 10.1002/adma.201504590. Epub 2015 Dec 14. Adv Mater. 2016. PMID: 26660004

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