3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene

Ju Young Kim; Joonwon Lim; Hyeong Min Jin; Bong Hoon Kim; Seong-Jun Jeong; Dong Sung Choi; Dong Jun Li; Sang Ouk Kim

doi:10.1002/adma.201504590

3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene

Adv Mater. 2016 Feb 24;28(8):1591-6. doi: 10.1002/adma.201504590. Epub 2015 Dec 14.

Authors

Ju Young Kim¹, Joonwon Lim¹, Hyeong Min Jin¹, Bong Hoon Kim¹, Seong-Jun Jeong¹, Dong Sung Choi¹, Dong Jun Li¹, Sang Ouk Kim¹

Affiliation

¹ National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Material Science & Engineering, KAIST, Daejeon, 34141, Republic of Korea.

PMID: 26660004
DOI: 10.1002/adma.201504590

Abstract

Novel 3D self-assembled nanopatterning is presented via tailored crumpling of chemically modified graphene. Block-copolymer self-assembly formed on a layer of chemically modified graphene provides highly dense and uniform 2D nanopatterns, and the controlled crumpling of the chemically modified graphene by mechanical instabilities realizes the controlled 3D transformation of the self-assembled nanopatterns.

Keywords: 3D; block copolymers; grapheme; instability; self-assembly.