Author Correction: Direct patterning of colloidal quantum dots with adaptable dual-ligand surface.
Hahm D, Lim J, Kim H, Shin JW, Hwang S, Rhee S, Chang JH, Yang J, Lim CH, Jo H, Choi B, Cho NS, Park YS, Lee DC, Hwang E, Chung S, Kang CM, Kang MS, Bae WK.
Hahm D, et al. Among authors: hwang e, hwang s.
Nat Nanotechnol. 2023 Apr;18(4):419. doi: 10.1038/s41565-022-01313-y.
Nat Nanotechnol. 2023.
PMID: 36899174
No abstract available.