Author Correction: Direct patterning of colloidal quantum dots with adaptable dual-ligand surface

Nat Nanotechnol. 2023 Apr;18(4):419. doi: 10.1038/s41565-022-01313-y.

¹ SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University (SKKU), Suwon, Republic of Korea.
² Department of Chemical and Biomolecular Engineering, Institute of Emergent Materials, Sogang University, Seoul, Republic of Korea.
³ Reality Display Research Section, Electronics and Telecommunications Research Institute (ETRI), Daejeon, Republic of Korea.
⁴ Soft Hybrid Materials Research Center, Korea Institute of Science and Technology, Seoul, Republic of Korea.
⁵ Advanced Materials Division, Korea Research Institute of Chemical Technology, Daejeon, Republic of Korea.
⁶ Department of Chemical and Biomolecular Engineering, KAIST Institute for the Nanocentury, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea.
⁷ Reality Display Research Section, Electronics and Telecommunications Research Institute (ETRI), Daejeon, Republic of Korea. nkcm@etri.re.kr.
⁸ Department of Chemical and Biomolecular Engineering, Institute of Emergent Materials, Sogang University, Seoul, Republic of Korea. kangms@sogang.ac.kr.
⁹ SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University (SKKU), Suwon, Republic of Korea. wkbae@skku.edu.

^# Contributed equally.

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