Skip to main page content
U.S. flag

An official website of the United States government

Dot gov

The .gov means it’s official.
Federal government websites often end in .gov or .mil. Before sharing sensitive information, make sure you’re on a federal government site.

Https

The site is secure.
The https:// ensures that you are connecting to the official website and that any information you provide is encrypted and transmitted securely.

Access keys NCBI Homepage MyNCBI Homepage Main Content Main Navigation

Search Page

Filters

My NCBI Filters

Results by year

Table representation of search results timeline featuring number of search results per year.

Year Number of Results
2007 1
2008 1
2009 2
2010 2
2011 2
2012 1
2013 6
2014 2
2015 4
2016 2
2017 2
2018 4
2019 1
2020 6
2021 2
2022 6
2023 7
2024 2

Text availability

Article attribute

Article type

Publication date

Search Results

49 results

Results by year

Filters applied: . Clear all
Page 1
Metal-free catalytic hydrogenation.
Chase PA, Welch GC, Jurca T, Stephan DW. Chase PA, et al. Among authors: jurca t. Angew Chem Int Ed Engl. 2007;46(42):8050-3. doi: 10.1002/anie.200702908. Angew Chem Int Ed Engl. 2007. PMID: 17696181 No abstract available.
Room temperature 3D carbon microprinting.
Torres-Davila FE, Chagoya KL, Blanco EE, Shahzad S, Shultz-Johnson LR, Mogensen M, Gesquiere A, Jurca T, Rochdi N, Blair RG, Tetard L. Torres-Davila FE, et al. Among authors: jurca t. Nat Commun. 2024 Mar 29;15(1):2745. doi: 10.1038/s41467-024-47076-z. Nat Commun. 2024. PMID: 38553437 Free PMC article.
Ultrathin Atomic Layer Deposited Al2O3 Overcoat Stabilizes Al2O3-Pt/Ni-Foam Hydrogenation Catalysts.
Rahmani A, Sultanov MA, Kamiru-White K, Shultz-Johnson LR, Butkus BE, Xie S, Liu F, Nguyen DTH, Wilson-Faubert N, Nazemi A, Banerjee P, Zhai L, Delferro M, Wen J, Jurca T. Rahmani A, et al. Among authors: jurca t. ACS Appl Mater Interfaces. 2023 Sep 20;15(37):43756-43766. doi: 10.1021/acsami.3c08545. Epub 2023 Sep 11. ACS Appl Mater Interfaces. 2023. PMID: 37695888
Low-Temperature Atomic Layer Deposition of MoS2 Films.
Jurca T, Moody MJ, Henning A, Emery JD, Wang B, Tan JM, Lohr TL, Lauhon LJ, Marks TJ. Jurca T, et al. Angew Chem Int Ed Engl. 2017 Apr 24;56(18):4991-4995. doi: 10.1002/anie.201611838. Epub 2017 Apr 3. Angew Chem Int Ed Engl. 2017. PMID: 28371057
49 results