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Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O2/C4F8 plasma etching process.
Phys Chem Chem Phys. 2022 Jun 8;24(22):13883-13896. doi: 10.1039/d2cp00289b.
Phys Chem Chem Phys. 2022.
PMID: 35621157
In Situ Monitoring of Surface Reactions during Atomic Layer Etching of Silicon Nitride Using Hydrogen Plasma and Fluorine Radicals.
Nakane K, Vervuurt RHJ, Tsutsumi T, Kobayashi N, Hori M.
Nakane K, et al. Among authors: tsutsumi t.
ACS Appl Mater Interfaces. 2019 Oct 9;11(40):37263-37269. doi: 10.1021/acsami.9b11489. Epub 2019 Sep 25.
ACS Appl Mater Interfaces. 2019.
PMID: 31513740
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Formation of spherical Sn particles by reducing SnO2 film in floating wire-assisted H2/Ar plasma at atmospheric pressure.
Nguyen TT, Sasaki M, Tsutsumi T, Ishikawa K, Hori M.
Nguyen TT, et al. Among authors: tsutsumi t.
Sci Rep. 2020 Oct 20;10(1):17770. doi: 10.1038/s41598-020-74663-z.
Sci Rep. 2020.
PMID: 33082404
Free PMC article.
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Wavelength dependence for silicon-wafer temperature measurement by autocorrelation-type frequency-domain low-coherence interferometry.
Tsutsumi T, Ohta T, Takeda K, Ito M, Hori M.
Tsutsumi T, et al.
Appl Opt. 2015 Aug 10;54(23):7088-93. doi: 10.1364/AO.54.007088.
Appl Opt. 2015.
PMID: 26368380
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Gene Expression of Osteoblast-like Cells on Carbon-Nanowall as Scaffolds during Incubation with Electrical Stimulation.
Ichikawa T, Kondo H, Ishikawa K, Tsutsumi T, Tanaka H, Sekine M, Hori M.
Ichikawa T, et al. Among authors: tsutsumi t.
ACS Appl Bio Mater. 2019 Jul 15;2(7):2698-2702. doi: 10.1021/acsabm.9b00178. Epub 2019 Jun 12.
ACS Appl Bio Mater. 2019.
PMID: 35030804
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