High-κ Dielectric (HfO2)/2D Semiconductor (HfSe2) Gate Stack for Low-Power Steep-Switching Computing Devices.
Kang T, Park J, Jung H, Choi H, Lee SM, Lee N, Lee RG, Kim G, Kim SH, Kim HJ, Yang CW, Jeon J, Kim YH, Lee S.
Kang T, et al. Among authors: kim yh, kim g, kim hj, kim sh.
Adv Mater. 2024 Mar 26:e2312747. doi: 10.1002/adma.202312747. Online ahead of print.
Adv Mater. 2024.
PMID: 38531112