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Pattern-integrated interference lithography: prospects for nano- and microelectronics.
Opt Express. 2012 Oct 8;20(21):23643-52. doi: 10.1364/OE.20.023643.
Opt Express. 2012.
PMID: 23188329
Free article.
Pattern-integrated interference lithography: single-exposure fabrication of photonic-crystal structures.
Burrow GM, Leibovici MC, Gaylord TK.
Burrow GM, et al.
Appl Opt. 2012 Jun 20;51(18):4028-41. doi: 10.1364/AO.51.004028.
Appl Opt. 2012.
PMID: 22722277
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Pattern-integrated interference [Invited].
Gaylord TK, Leibovici MC, Burrow GM.
Gaylord TK, et al. Among authors: burrow gm.
Appl Opt. 2013 Jan 1;52(1):61-72. doi: 10.1364/AO.52.000061.
Appl Opt. 2013.
PMID: 23292376
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Pattern-integrated interference lithography instrumentation.
Burrow GM, Leibovici MC, Kummer JW, Gaylord TK.
Burrow GM, et al.
Rev Sci Instrum. 2012 Jun;83(6):063707. doi: 10.1063/1.4729666.
Rev Sci Instrum. 2012.
PMID: 22755634
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Three-beam interference lithography methodology.
Stay JL, Burrow GM, Gaylord TK.
Stay JL, et al. Among authors: burrow gm.
Rev Sci Instrum. 2011 Feb;82(2):023115. doi: 10.1063/1.3535557.
Rev Sci Instrum. 2011.
PMID: 21361581
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