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Covalent formation of nanoscale fullerene and dendrimer patterns.
Langmuir. 2007 Feb 27;23(5):2297-9. doi: 10.1021/la0631973. Epub 2007 Feb 2.
Langmuir. 2007.
PMID: 17269811
AFM-induced amine deprotection: triggering localized bond cleavage by application of tip/substrate voltage bias for the surface self-assembly of nanosized dendritic objects.
Fresco ZM, Suez I, Backer SA, Fréchet JM.
Fresco ZM, et al. Among authors: suez i.
J Am Chem Soc. 2004 Jul 14;126(27):8374-5. doi: 10.1021/ja047774q.
J Am Chem Soc. 2004.
PMID: 15237983
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Generating an etch resistant "resist" layer from common solvents using scanning probe lithography in a fluid cell.
Suez I, Backer SA, Fréchet JM.
Suez I, et al.
Nano Lett. 2005 Feb;5(2):321-4. doi: 10.1021/nl048014g.
Nano Lett. 2005.
PMID: 15794619
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Fluorocarbon resist for high-speed scanning probe lithography.
Rolandi M, Suez I, Scholl A, Fréchet JM.
Rolandi M, et al. Among authors: suez i.
Angew Chem Int Ed Engl. 2007;46(39):7477-80. doi: 10.1002/anie.200701496.
Angew Chem Int Ed Engl. 2007.
PMID: 17702084
No abstract available.
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Reconstitution of the M13 major coat protein and its transmembrane peptide segment on a DNA template.
Li W, Suez I, Szoka FC Jr.
Li W, et al. Among authors: suez i.
Biochemistry. 2007 Jul 24;46(29):8579-91. doi: 10.1021/bi700165m. Epub 2007 Jun 27.
Biochemistry. 2007.
PMID: 17595059
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