AFM-induced amine deprotection: triggering localized bond cleavage by application of tip/substrate voltage bias for the surface self-assembly of nanosized dendritic objects

Zachary M Fresco; Itai Suez; Scott A Backer; Jean M J Fréchet

doi:10.1021/ja047774q

AFM-induced amine deprotection: triggering localized bond cleavage by application of tip/substrate voltage bias for the surface self-assembly of nanosized dendritic objects

J Am Chem Soc. 2004 Jul 14;126(27):8374-5. doi: 10.1021/ja047774q.

Authors

Zachary M Fresco¹, Itai Suez, Scott A Backer, Jean M J Fréchet

Affiliation

¹ Department of Chemistry, University of California Berkeley, Berkeley, California, 94720-1460, USA.

PMID: 15237983
DOI: 10.1021/ja047774q

Abstract

An alpha,alpha-dimethyl-3,5-dimethoxybenzyloxycarbonyl (DDZ)-protected amine monolayer can be selectively deprotected by the application of a voltage bias from a conducting AFM tip to afford localized nanoscale patterns that can be visualized by self-assembly of dendritic molecular objects with terminal carboxylic acid groups and different aspect ratios.