In this study, the orientation of block copolymer (BCP) patterns in topographical templates is controlled using a simple template design rule. The orientation of the pattern is selected by using a template with one commensurate dimension and one incommensurate dimension. An array of binary states of a BCP pattern can be programmed into a desired layout by tuning of the template wall thickness.
Keywords: block copolymers; directed self-assembly; graphoepitaxy; nanolithography; nanopatterns.