Heavily Boron-Doped Silicon Layer for the Fabrication of Nanoscale Thermoelectric Devices.
Ma Z, Liu Y, Deng L, Zhang M, Zhang S, Ma J, Song P, Liu Q, Ji A, Yang F, Wang X.
Ma Z, et al. Among authors: zhang m, zhang s.
Nanomaterials (Basel). 2018 Jan 30;8(2):77. doi: 10.3390/nano8020077.
Nanomaterials (Basel). 2018.
PMID: 29385759
Free PMC article.