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Hybrid nanoimprint-soft lithography with sub-15 nm resolution.
Li Z, Gu Y, Wang L, Ge H, Wu W, Xia Q, Yuan C, Chen Y, Cui B, Williams RS. Li Z, et al. Among authors: williams rs. Nano Lett. 2009 Jun;9(6):2306-10. doi: 10.1021/nl9004892. Nano Lett. 2009. PMID: 19422192 Free article.
Circuit fabrication at 17 nm half-pitch by nanoimprint lithography.
Jung GY, Johnston-Halperin E, Wu W, Yu Z, Wang SY, Tong WM, Li Z, Green JE, Sheriff BA, Boukai A, Bunimovich Y, Heath JR, Williams RS. Jung GY, et al. Among authors: williams rs. Nano Lett. 2006 Mar;6(3):351-4. doi: 10.1021/nl052110f. Nano Lett. 2006. PMID: 16522021
Sub-10 nm nanoimprint lithography by wafer bowing.
Wu W, Tong WM, Bartman J, Chen Y, Walmsley R, Yu Z, Xia Q, Park I, Picciotto C, Gao J, Wang SY, Morecroft D, Yang J, Berggren KK, Williams RS. Wu W, et al. Among authors: williams rs. Nano Lett. 2008 Nov;8(11):3865-9. doi: 10.1021/nl802295n. Epub 2008 Oct 7. Nano Lett. 2008. PMID: 18837563
742 results