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Saturation profile based conformality analysis for atomic layer deposition: aluminum oxide in lateral high-aspect-ratio channels.
Phys Chem Chem Phys. 2020 Oct 21;22(40):23107-23120. doi: 10.1039/d0cp03358h.
Phys Chem Chem Phys. 2020.
PMID: 33025987
Conformality of atomic layer deposition in microchannels: impact of process parameters on the simulated thickness profile.
Yim J, Verkama E, Velasco JA, Arts K, Puurunen RL.
Yim J, et al. Among authors: verkama e.
Phys Chem Chem Phys. 2022 Apr 13;24(15):8645-8660. doi: 10.1039/d1cp04758b.
Phys Chem Chem Phys. 2022.
PMID: 35353098
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