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Mechanisms for Graphene Growth on SiO2 Using Plasma-Enhanced Chemical Vapor Deposition: A Density Functional Theory Study.
ACS Appl Mater Interfaces. 2022 Feb 23;14(7):9492-9503. doi: 10.1021/acsami.1c23603. Epub 2022 Feb 9.
ACS Appl Mater Interfaces. 2022.
PMID: 35138793
Theoretical evaluation of thermal decomposition of dichlorosilane for plasma-enhanced atomic layer deposition of silicon nitride: the important role of surface hydrogen.
Hartmann G , Ventzek PLG , Iwao T , Ishibashi K , Hwang GS .
Hartmann G , et al. Among authors: ventzek plg.
Phys Chem Chem Phys. 2018 Nov 28;20(46):29152-29158. doi: 10.1039/c8cp06272b.
Phys Chem Chem Phys. 2018.
PMID: 30426994
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Radial spatiotemporal evolution of rf magnetic field and plasma current in a very-high-frequency plasma source over a wide range of plasma density and pressure.
Zhao J, Ventzek PLG, Lane B, Iwao T, Ishibashi K.
Zhao J, et al. Among authors: ventzek plg.
Phys Rev E. 2021 Aug;104(2-2):025207. doi: 10.1103/PhysRevE.104.025207.
Phys Rev E. 2021.
PMID: 34525658
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