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Low-Temperature Wet Conformal Nickel Silicide Deposition for Transistor Technology through an Organometallic Approach.
Lin TH, Margossian T, De Marchi M, Thammasack M, Zemlyanov D, Kumar S, Jagielski J, Zheng LQ, Shih CJ, Zenobi R, De Micheli G, Baudouin D, Gaillardon PE, Copéret C. Lin TH, et al. Among authors: thammasack m. ACS Appl Mater Interfaces. 2017 Feb 8;9(5):4948-4955. doi: 10.1021/acsami.6b13852. Epub 2017 Jan 25. ACS Appl Mater Interfaces. 2017. PMID: 28078888