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Graphene removal by water-assisted focused electron-beam-induced etching - unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO2 substrates.
Szkudlarek A, Michalik JM, Serrano-Esparza I, Nováček Z, Novotná V, Ozga P, Kapusta C, De Teresa JM. Szkudlarek A, et al. Beilstein J Nanotechnol. 2024 Feb 7;15:190-198. doi: 10.3762/bjnano.15.18. eCollection 2024. Beilstein J Nanotechnol. 2024. PMID: 38352720 Free PMC article.
Continuum models of focused electron beam induced processing.
Toth M, Lobo C, Friedli V, Szkudlarek A, Utke I. Toth M, et al. Among authors: szkudlarek a. Beilstein J Nanotechnol. 2015 Jul 14;6:1518-40. doi: 10.3762/bjnano.6.157. eCollection 2015. Beilstein J Nanotechnol. 2015. PMID: 26425405 Free PMC article. Review.
40 results