Nanoscale patterning at the Si/SiO2/graphene interface by focused He+ beam.
Böttcher A, Schwaiger R, Pazdera TM, Exner D, Hauns J, Strelnikov D, Lebedkin S, Gröger R, Esch F, Lechner BAJ, Kappes MM.
Böttcher A, et al. Among authors: schwaiger r.
Nanotechnology. 2020 Dec 11;31(50):505302. doi: 10.1088/1361-6528/abb5cf.
Nanotechnology. 2020.
PMID: 33021238