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Ferroelectricity in bulk hafnia.
Mikolajick T, Schroeder U. Mikolajick T, et al. Among authors: schroeder u. Nat Mater. 2021 Jun;20(6):718-719. doi: 10.1038/s41563-020-00914-z. Nat Mater. 2021. PMID: 33495628 No abstract available.
Electric field cycling behavior of ferroelectric hafnium oxide.
Schenk T, Schroeder U, Pešić M, Popovici M, Pershin YV, Mikolajick T. Schenk T, et al. Among authors: schroeder u. ACS Appl Mater Interfaces. 2014 Nov 26;6(22):19744-51. doi: 10.1021/am504837r. Epub 2014 Nov 14. ACS Appl Mater Interfaces. 2014. PMID: 25365475
Ferroelectricity and antiferroelectricity of doped thin HfO2-based films.
Park MH, Lee YH, Kim HJ, Kim YJ, Moon T, Kim KD, Müller J, Kersch A, Schroeder U, Mikolajick T, Hwang CS. Park MH, et al. Among authors: schroeder u. Adv Mater. 2015 Mar 18;27(11):1811-31. doi: 10.1002/adma.201404531. Epub 2015 Feb 11. Adv Mater. 2015. PMID: 25677113
Dynamic leakage current compensation revisited.
Schenk T, Schroeder U, Mikolajick T. Schenk T, et al. Among authors: schroeder u. IEEE Trans Ultrason Ferroelectr Freq Control. 2015 Mar;62(3):596-9. doi: 10.1109/TUFFC.2014.006774. IEEE Trans Ultrason Ferroelectr Freq Control. 2015. PMID: 25768825
Complex Internal Bias Fields in Ferroelectric Hafnium Oxide.
Schenk T, Hoffmann M, Ocker J, Pešić M, Mikolajick T, Schroeder U. Schenk T, et al. Among authors: schroeder u. ACS Appl Mater Interfaces. 2015 Sep 16;7(36):20224-33. doi: 10.1021/acsami.5b05773. Epub 2015 Sep 1. ACS Appl Mater Interfaces. 2015. PMID: 26308500
Breakdown and Protection of ALD Moisture Barrier Thin Films.
Nehm F, Klumbies H, Richter C, Singh A, Schroeder U, Mikolajick T, Mönch T, Hoßbach C, Albert M, Bartha JW, Leo K, Müller-Meskamp L. Nehm F, et al. Among authors: schroeder u. ACS Appl Mater Interfaces. 2015 Oct 14;7(40):22121-7. doi: 10.1021/acsami.5b06891. Epub 2015 Sep 30. ACS Appl Mater Interfaces. 2015. PMID: 26399760
Switching Kinetics in Nanoscale Hafnium Oxide Based Ferroelectric Field-Effect Transistors.
Mulaosmanovic H, Ocker J, Müller S, Schroeder U, Müller J, Polakowski P, Flachowsky S, van Bentum R, Mikolajick T, Slesazeck S. Mulaosmanovic H, et al. Among authors: schroeder u. ACS Appl Mater Interfaces. 2017 Feb 1;9(4):3792-3798. doi: 10.1021/acsami.6b13866. Epub 2017 Jan 24. ACS Appl Mater Interfaces. 2017. PMID: 28071052
Lanthanum-Doped Hafnium Oxide: A Robust Ferroelectric Material.
Schroeder U, Richter C, Park MH, Schenk T, Pešić M, Hoffmann M, Fengler FPG, Pohl D, Rellinghaus B, Zhou C, Chung CC, Jones JL, Mikolajick T. Schroeder U, et al. Inorg Chem. 2018 Mar 5;57(5):2752-2765. doi: 10.1021/acs.inorgchem.7b03149. Epub 2018 Feb 15. Inorg Chem. 2018. PMID: 29446630
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