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2014 | 1 |
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Electron beam lithography with feedback using in situ self-developed resist.
Nanoscale Res Lett. 2014 Apr 16;9(1):184. doi: 10.1186/1556-276X-9-184. eCollection 2014.
Nanoscale Res Lett. 2014.
PMID: 24739818
Free PMC article.
Effect of molecular weight distribution on e-beam exposure properties of polystyrene.
Dey RK, Cui B.
Dey RK, et al.
Nanotechnology. 2013 Jun 21;24(24):245302. doi: 10.1088/0957-4484/24/24/245302. Epub 2013 May 20.
Nanotechnology. 2013.
PMID: 23689983
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