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Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS.
Materials (Basel). 2015 Nov 18;8(11):7805-7812. doi: 10.3390/ma8115425.
Materials (Basel). 2015.
PMID: 28793679
Free PMC article.
Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide.
Ratzsch S, Kley EB, Tünnermann A, Szeghalmi A.
Ratzsch S, et al.
Nanotechnology. 2015 Jan 16;26(2):024003. doi: 10.1088/0957-4484/26/2/024003. Epub 2014 Dec 19.
Nanotechnology. 2015.
PMID: 25525676
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Encapsulation process for diffraction gratings.
Ratzsch S, Kley EB, Tünnermann A, Szeghalmi A.
Ratzsch S, et al.
Opt Express. 2015 Jul 13;23(14):17955-65. doi: 10.1364/OE.23.017955.
Opt Express. 2015.
PMID: 26191855
Free article.
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