Development of controlled nanosphere lithography technology.
Osipov AA, Gagaeva AE, Speshilova AB, Endiiarova EV, Bespalova PG, Osipov AA, Belyanov IA, Tyurikov KS, Tyurikova IA, Alexandrov SE.
Osipov AA, et al.
Sci Rep. 2023 Feb 27;13(1):3350. doi: 10.1038/s41598-023-29077-y.
Sci Rep. 2023.
PMID: 36849515
Free PMC article.