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A Comparative Study on the Ferroelectric Performances in Atomic Layer Deposited Hf0.5Zr0.5O2 Thin Films Using Tetrakis(ethylmethylamino) and Tetrakis(dimethylamino) Precursors.
Kim BS, Hyun SD, Moon T, Do Kim K, Lee YH, Park HW, Lee YB, Roh J, Kim BY, Kim HH, Park MH, Hwang CS. Kim BS, et al. Among authors: lee yb, lee yh. Nanoscale Res Lett. 2020 Apr 7;15(1):72. doi: 10.1186/s11671-020-03301-4. Nanoscale Res Lett. 2020. PMID: 32266598 Free PMC article.
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