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Study of Si and Ge Atoms Termination Using H-Dilution in SiGe:H Alloys Deposited by Radio Frequency (13.56 MHz) Plasma Discharge at Low Temperature.
Materials (Basel). 2020 Feb 26;13(5):1045. doi: 10.3390/ma13051045.
Materials (Basel). 2020.
PMID: 32110866
Free PMC article.
Cu-Doped ZnO Thin Films Deposited by a Sol-Gel Process Using Two Copper Precursors: Gas-Sensing Performance in a Propane Atmosphere.
Gómez-Pozos H, Arredondo EJL, Maldonado Álvarez A, Biswal R, Kudriavtsev Y, Pérez JV, Casallas-Moreno YL, Olvera Amador ML.
Gómez-Pozos H, et al. Among authors: kudriavtsev y.
Materials (Basel). 2016 Jan 29;9(2):87. doi: 10.3390/ma9020087.
Materials (Basel). 2016.
PMID: 28787885
Free PMC article.
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