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Low Temperature Thermal Atomic Layer Deposition of Aluminum Nitride Using Hydrazine as the Nitrogen Source.
Materials (Basel). 2020 Jul 31;13(15):3387. doi: 10.3390/ma13153387.
Materials (Basel). 2020.
PMID: 32751836
Free PMC article.
Investigation of the Physical Properties of Plasma Enhanced Atomic Layer Deposited Silicon Nitride as Etch Stopper.
Kim HS, Meng X, Kim SJ, Lucero AT, Cheng L, Byun YC, Lee JS, Hwang SM, Kondusamy ALN, Wallace RM, Goodman G, Wan AS, Telgenhoff M, Hwang BK, Kim J.
Kim HS, et al. Among authors: kondusamy aln.
ACS Appl Mater Interfaces. 2018 Dec 26;10(51):44825-44833. doi: 10.1021/acsami.8b15291. Epub 2018 Dec 11.
ACS Appl Mater Interfaces. 2018.
PMID: 30485061
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A Three-Stage Magnetic Phase Transition Revealed in Ultrahigh-Quality van der Waals Bulk Magnet CrSBr.
Liu W, Guo X, Schwartz J, Xie H, Dhale NU, Sung SH, Kondusamy ALN, Wang X, Zhao H, Berman D, Hovden R, Zhao L, Lv B.
Liu W, et al. Among authors: kondusamy aln.
ACS Nano. 2022 Oct 25;16(10):15917-15926. doi: 10.1021/acsnano.2c02896. Epub 2022 Sep 23.
ACS Nano. 2022.
PMID: 36149801
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