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Effect of Mask Geometry Variation on Plasma Etching Profiles.
Micromachines (Basel). 2023 Mar 16;14(3):665. doi: 10.3390/mi14030665.
Micromachines (Basel). 2023.
PMID: 36985072
Free PMC article.
Modeling of Gate Stack Patterning for Advanced Technology Nodes: A Review.
Klemenschits X, Selberherr S, Filipovic L.
Klemenschits X, et al.
Micromachines (Basel). 2018 Nov 29;9(12):631. doi: 10.3390/mi9120631.
Micromachines (Basel). 2018.
PMID: 30501054
Free PMC article.
Review.
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