A Comprehensive Study on the Effect of TiN Top and Bottom Electrodes on Atomic Layer Deposited Ferroelectric Hf0.5Zr0.5O2 Thin Films.
Kim SJ, Mohan J, Kim HS, Hwang SM, Kim N, Jung YC, Sahota A, Kim K, Yu HY, Cha PR, Young CD, Choi R, Ahn J, Kim J.
Kim SJ, et al. Among authors: kim n, kim hs, kim j, kim k.
Materials (Basel). 2020 Jul 2;13(13):2968. doi: 10.3390/ma13132968.
Materials (Basel). 2020.
PMID: 32630791
Free PMC article.