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Partially Fluorinated Graphene: Structural and Electrical Characterization.
Cheng L, Jandhyala S, Mordi G, Lucero AT, Huang J, Azcatl A, Addou R, Wallace RM, Colombo L, Kim J. Cheng L, et al. Among authors: kim j. ACS Appl Mater Interfaces. 2016 Feb;8(7):5002-8. doi: 10.1021/acsami.5b11701. Epub 2016 Feb 10. ACS Appl Mater Interfaces. 2016. PMID: 26820099
Three-dimensional observation of TiO2 nanostructures by electron tomography.
Suh YJ, Lu N, Park SY, Lee TH, Lee SH, Cha DK, Lee MG, Huang J, Kim SS, Sohn BH, Kim GH, Ko MJ, Kim J, Kim MJ. Suh YJ, et al. Among authors: kim ss, kim gh, kim j, kim mj. Micron. 2013 Mar;46:35-42. doi: 10.1016/j.micron.2012.12.002. Epub 2012 Dec 16. Micron. 2013. PMID: 23313130
Metal contacts on physical vapor deposited monolayer MoS2.
Gong C, Huang C, Miller J, Cheng L, Hao Y, Cobden D, Kim J, Ruoff RS, Wallace RM, Cho K, Xu X, Chabal YJ. Gong C, et al. Among authors: kim j. ACS Nano. 2013 Dec 23;7(12):11350-7. doi: 10.1021/nn4052138. Epub 2013 Nov 14. ACS Nano. 2013. PMID: 24219632
Silicon interfacial passivation layer chemistry for high-k/InP interfaces.
Dong H, Cabrera W, Qin X, Brennan B, Zhernokletov D, Hinkle CL, Kim J, Chabal YJ, Wallace RM. Dong H, et al. Among authors: kim j. ACS Appl Mater Interfaces. 2014 May 28;6(10):7340-5. doi: 10.1021/am500752u. Epub 2014 Apr 30. ACS Appl Mater Interfaces. 2014. PMID: 24750024
Seeding atomic layer deposition of alumina on graphene with yttria.
Dahal A, Addou R, Azcatl A, Coy-Diaz H, Lu N, Peng X, de Dios F, Kim J, Kim MJ, Wallace RM, Batzill M. Dahal A, et al. Among authors: kim j, kim mj. ACS Appl Mater Interfaces. 2015 Jan 28;7(3):2082-7. doi: 10.1021/am508154n. Epub 2015 Jan 15. ACS Appl Mater Interfaces. 2015. PMID: 25556522
129,675 results
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