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Investigations on the Role of N₂:(N₂ + CH₄) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at Low Temperature.
Materials (Basel). 2017 Jan 24;10(2):102. doi: 10.3390/ma10020102.
Materials (Basel). 2017.
PMID: 28772460
Free PMC article.
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