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Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies.
Faraz T, Knoops HCM, Verheijen MA, van Helvoirt CAA, Karwal S, Sharma A, Beladiya V, Szeghalmi A, Hausmann DM, Henri J, Creatore M, Kessels WMM. Faraz T, et al. Among authors: kessels wmm. ACS Appl Mater Interfaces. 2018 Apr 18;10(15):13158-13180. doi: 10.1021/acsami.8b00183. Epub 2018 Apr 9. ACS Appl Mater Interfaces. 2018. PMID: 29554799 Free PMC article.
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