Low Temperature Thermal Atomic Layer Deposition of Aluminum Nitride Using Hydrazine as the Nitrogen Source.
Jung YC, Hwang SM, Le DN, Kondusamy ALN, Mohan J, Kim SW, Kim JH, Lucero AT, Ravichandran A, Kim HS, Kim SJ, Choi R, Ahn J, Alvarez D, Spiegelman J, Kim J.
Jung YC, et al.
Materials (Basel). 2020 Jul 31;13(15):3387. doi: 10.3390/ma13153387.
Materials (Basel). 2020.
PMID: 32751836
Free PMC article.