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Room-Temperature Patterning of Nanoscale MoS2 under an Electron Beam.
Saifullah MSM, Asbahi M, Binti-Kamran Kiyani M, Liow SS, Bin Dolmanan S, Yong AM, Ong EAH, Ibn Saifullah A, Tan HR, Dwivedi N, Dutta T, Ganesan R, Valiyaveettil S, Chong KSL, Tripathy S. Saifullah MSM, et al. Among authors: ganesan r. ACS Appl Mater Interfaces. 2020 Apr 8;12(14):16772-16781. doi: 10.1021/acsami.9b22229. Epub 2020 Mar 25. ACS Appl Mater Interfaces. 2020. PMID: 32175725
Patterning at the Resolution Limit of Commercial Electron Beam Lithography.
Saifullah MSM, Asbahi M, Neo DCJ, Mahfoud Z, Tan HR, Ha ST, Dwivedi N, Dutta T, Bin Dolmanan S, Aabdin Z, Bosman M, Ganesan R, Tripathy S, Hasko DG, Valiyaveettil S. Saifullah MSM, et al. Among authors: ganesan r. Nano Lett. 2022 Sep 28;22(18):7432-7440. doi: 10.1021/acs.nanolett.2c02339. Epub 2022 Sep 7. Nano Lett. 2022. PMID: 36069429
425 results