Ferrarese Lupi F - Search Results

1

GISAXS Analysis of the In-Depth Morphology of Thick PS-b-PMMA Films.

Ferrarese Lupi F, Giammaria TJ, Seguini G, Laus M, Dubček P, Pivac B, Bernstorff S, Perego M. Ferrarese Lupi F, et al. ACS Appl Mater Interfaces. 2017 Mar 29;9(12):11054-11063. doi: 10.1021/acsami.7b01366. Epub 2017 Mar 14. ACS Appl Mater Interfaces. 2017. PMID: 28263052

2

Collective behavior of block copolymer thin films within periodic topographical structures.

Perego M, Andreozzi A, Vellei A, Ferrarese Lupi F, Seguini G. Perego M, et al. Among authors: ferrarese lupi f. Nanotechnology. 2013 Jun 21;24(24):245301. doi: 10.1088/0957-4484/24/24/245301. Epub 2013 May 16. Nanotechnology. 2013. PMID: 23680847

3

Rapid thermal processing of self-assembling block copolymer thin films.

Ferrarese Lupi F, Giammaria TJ, Ceresoli M, Seguini G, Sparnacci K, Antonioli D, Gianotti V, Laus M, Perego M. Ferrarese Lupi F, et al. Nanotechnology. 2013 Aug 9;24(31):315601. doi: 10.1088/0957-4484/24/31/315601. Epub 2013 Jul 12. Nanotechnology. 2013. PMID: 23851718

4

Fine tuning of lithographic masks through thin films of PS-b-PMMA with different molar mass by rapid thermal processing.

Ferrarese Lupi F, Giammaria TJ, Seguini G, Vita F, Francescangeli O, Sparnacci K, Antonioli D, Gianotti V, Laus M, Perego M. Ferrarese Lupi F, et al. ACS Appl Mater Interfaces. 2014 May 28;6(10):7180-8. doi: 10.1021/am5003074. Epub 2014 May 7. ACS Appl Mater Interfaces. 2014. PMID: 24738855

5

Evolution of lateral ordering in symmetric block copolymer thin films upon rapid thermal processing.

Ceresoli M, Ferrarese Lupi F, Seguini G, Sparnacci K, Gianotti V, Antonioli D, Laus M, Boarino L, Perego M. Ceresoli M, et al. Among authors: ferrarese lupi f. Nanotechnology. 2014 Jul 11;25(27):275601. doi: 10.1088/0957-4484/25/27/275601. Epub 2014 Jun 24. Nanotechnology. 2014. PMID: 24960172

6

Characterization of ultra-thin polymeric films by Gas chromatography-Mass spectrometry hyphenated to thermogravimetry.

Gianotti V, Antonioli D, Sparnacci K, Laus M, Giammaria TJ, Ceresoli M, Ferrarese Lupi F, Seguini G, Perego M. Gianotti V, et al. Among authors: ferrarese lupi f. J Chromatogr A. 2014 Nov 14;1368:204-10. doi: 10.1016/j.chroma.2014.09.073. Epub 2014 Oct 2. J Chromatogr A. 2014. PMID: 25311490

7

High aspect ratio PS-b-PMMA block copolymer masks for lithographic applications.

Ferrarese Lupi F, Giammaria TJ, Volpe FG, Lotto F, Seguini G, Pivac B, Laus M, Perego M. Ferrarese Lupi F, et al. ACS Appl Mater Interfaces. 2014 Dec 10;6(23):21389-96. doi: 10.1021/am506391n. Epub 2014 Nov 20. ACS Appl Mater Interfaces. 2014. PMID: 25387131

8

Thermal stability of functional P(S-r-MMA) random copolymers for nanolithographic applications.

Sparnacci K, Antonioli D, Gianotti V, Laus M, Zuccheri G, Ferrarese Lupi F, Giammaria TJ, Seguini G, Ceresoli M, Perego M. Sparnacci K, et al. Among authors: ferrarese lupi f. ACS Appl Mater Interfaces. 2015 Feb 25;7(7):3920-30. doi: 10.1021/am509088s. Epub 2015 Feb 17. ACS Appl Mater Interfaces. 2015. PMID: 25664773

9

Resistive switching in high-density nanodevices fabricated by block copolymer self-assembly.

Frascaroli J, Brivio S, Ferrarese Lupi F, Seguini G, Boarino L, Perego M, Spiga S. Frascaroli J, et al. Among authors: ferrarese lupi f. ACS Nano. 2015 Mar 24;9(3):2518-29. doi: 10.1021/nn505131b. Epub 2015 Mar 10. ACS Nano. 2015. PMID: 25743480

10

Neutral wetting brush layers for block copolymer thin films using homopolymer blends processed at high temperatures.

Ceresoli M, Palermo M, Ferrarese Lupi F, Seguini G, Perego M, Zuccheri G, Phadatare SD, Antonioli D, Gianotti V, Sparnacci K, Laus M. Ceresoli M, et al. Among authors: ferrarese lupi f. Nanotechnology. 2015 Oct 16;26(41):415603. doi: 10.1088/0957-4484/26/41/415603. Epub 2015 Sep 25. Nanotechnology. 2015. PMID: 26404164

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