Self-terminating protocol for an interfacial complexation reaction in vacuo by metal-organic chemical vapor deposition.
Papageorgiou AC, Fischer S, Oh SC, Sağlam O, Reichert J, Wiengarten A, Seufert K, Vijayaraghavan S, Ecija D, Auwärter W, Allegretti F, Acres RG, Prince KC, Diller K, Klappenberger F, Barth JV.
Papageorgiou AC, et al. Among authors: acres rg.
ACS Nano. 2013 May 28;7(5):4520-6. doi: 10.1021/nn401171z. Epub 2013 May 3.
ACS Nano. 2013.
PMID: 23641683