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Table representation of search results timeline featuring number of search results per year.
Year | Number of Results |
---|---|
2022 | 3 |
2023 | 4 |
2024 | 0 |
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7 results
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Page 1
Study on OH Radical Production Depending on the Pulse Characteristics in an Atmospheric-Pressure Nanosecond-Pulsed Plasma Jet.
Materials (Basel). 2023 May 19;16(10):3846. doi: 10.3390/ma16103846.
Materials (Basel). 2023.
PMID: 37241472
Free PMC article.
Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Controlled.
Jeong W, Kim S, Lee Y, Cho C, Seong I, You Y, Choi M, Lee J, Seol Y, You S.
Jeong W, et al.
Materials (Basel). 2023 May 18;16(10):3820. doi: 10.3390/ma16103820.
Materials (Basel). 2023.
PMID: 37241447
Free PMC article.
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On the Quenching of Electron Temperature in Inductively Coupled Plasma.
Seong I, Kim SJ, Lee Y, Cho C, Jeong W, You Y, Choi M, Choi B, You S.
Seong I, et al.
Materials (Basel). 2023 Apr 19;16(8):3219. doi: 10.3390/ma16083219.
Materials (Basel). 2023.
PMID: 37110054
Free PMC article.
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Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method.
Cho C, Kim S, Lee Y, Seong I, Jeong W, You Y, Choi M, You S.
Cho C, et al.
Materials (Basel). 2023 Mar 30;16(7):2762. doi: 10.3390/ma16072762.
Materials (Basel). 2023.
PMID: 37049056
Free PMC article.
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Investigation into SiO2 Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled.
Jeong WN, Lee YS, Cho CH, Seong IH, You SJ.
Jeong WN, et al.
Nanomaterials (Basel). 2022 Dec 15;12(24):4457. doi: 10.3390/nano12244457.
Nanomaterials (Basel). 2022.
PMID: 36558310
Free PMC article.
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Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma.
Seong I, Lee J, Kim S, Lee Y, Cho C, Lee J, Jeong W, You Y, You S.
Seong I, et al.
Nanomaterials (Basel). 2022 Nov 10;12(22):3963. doi: 10.3390/nano12223963.
Nanomaterials (Basel). 2022.
PMID: 36432249
Free PMC article.
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Influence of Additive N2 on O2 Plasma Ashing Process in Inductively Coupled Plasma.
You YB, Lee YS, Kim SJ, Cho CH, Seong IH, Jeong WN, Choi MS, You SJ.
You YB, et al.
Nanomaterials (Basel). 2022 Oct 27;12(21):3798. doi: 10.3390/nano12213798.
Nanomaterials (Basel). 2022.
PMID: 36364574
Free PMC article.
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