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A Comprehensive Study on the Effect of TiN Top and Bottom Electrodes on Atomic Layer Deposited Ferroelectric Hf0.5Zr0.5O2 Thin Films.
Materials (Basel). 2020 Jul 2;13(13):2968. doi: 10.3390/ma13132968.
Materials (Basel). 2020.
PMID: 32630791
Free PMC article.
Low Temperature Thermal Atomic Layer Deposition of Aluminum Nitride Using Hydrazine as the Nitrogen Source.
Jung YC, Hwang SM, Le DN, Kondusamy ALN, Mohan J, Kim SW, Kim JH, Lucero AT, Ravichandran A, Kim HS, Kim SJ, Choi R, Ahn J, Alvarez D, Spiegelman J, Kim J.
Jung YC, et al.
Materials (Basel). 2020 Jul 31;13(15):3387. doi: 10.3390/ma13153387.
Materials (Basel). 2020.
PMID: 32751836
Free PMC article.
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