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Page 1
Structural, optical, and mechanical properties of TiO2 nanolaminates.
Nanotechnology. 2021 Feb 26;32(9):095709. doi: 10.1088/1361-6528/abcbc1.
Nanotechnology. 2021.
PMID: 33207326
Plasma-Enhanced Atomic Layer Deposition of HfO2 with Substrate Biasing: Thin Films for High-Reflective Mirrors.
Beladiya V, Faraz T, Schmitt P, Munser AS, Schröder S, Riese S, Mühlig C, Schachtler D, Steger F, Botha R, Otto F, Fritz T, van Helvoirt C, Kessels WMM, Gargouri H, Szeghalmi A.
Beladiya V, et al.
ACS Appl Mater Interfaces. 2022 Mar 30;14(12):14677-14692. doi: 10.1021/acsami.1c21889. Epub 2022 Mar 21.
ACS Appl Mater Interfaces. 2022.
PMID: 35311275
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Conformal antireflection coatings for optical dome covers by atomic layer deposition.
Gerold K, Beladiya V, Paul P, Kästner D, Saarniheimo M, Niiranen K, Schröder S, Szeghalmi A.
Gerold K, et al. Among authors: beladiya v.
Appl Opt. 2023 Mar 1;62(7):B92-B96. doi: 10.1364/AO.477069.
Appl Opt. 2023.
PMID: 37132891
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Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: an experimental and computational study.
Beladiya V , Becker M , Faraz T , Kessels WMME , Schenk P , Otto F , Fritz T , Gruenewald M , Helbing C , Jandt KD , Tünnermann A , Sierka M , Szeghalmi A .
Beladiya V , et al.
Nanoscale. 2020 Jan 23;12(3):2089-2102. doi: 10.1039/c9nr07202k.
Nanoscale. 2020.
PMID: 31912855
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Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies.
Faraz T, Knoops HCM, Verheijen MA, van Helvoirt CAA, Karwal S, Sharma A, Beladiya V, Szeghalmi A, Hausmann DM, Henri J, Creatore M, Kessels WMM.
Faraz T, et al. Among authors: beladiya v.
ACS Appl Mater Interfaces. 2018 Apr 18;10(15):13158-13180. doi: 10.1021/acsami.8b00183. Epub 2018 Apr 9.
ACS Appl Mater Interfaces. 2018.
PMID: 29554799
Free PMC article.
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