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Page 1
Molecular Modeling of EUV Photoresist Revealing the Effect of Chain Conformation on Line-Edge Roughness Formation.
Polymers (Basel). 2019 Nov 22;11(12):1923. doi: 10.3390/polym11121923.
Polymers (Basel). 2019.
PMID: 31766636
Free PMC article.
Dielectric Response Spectroscopy as Means to Investigate Interfacial Effects for Ultra-Thin Film Polymer-Based High NA EUV Lithography.
Severi J, De Simone D, De Gendt S.
Severi J, et al.
Polymers (Basel). 2020 Dec 12;12(12):2971. doi: 10.3390/polym12122971.
Polymers (Basel). 2020.
PMID: 33322737
Free PMC article.
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