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Page 1
Coarse-Grained Modeling of EUV Patterning Process Reflecting Photochemical Reactions and Chain Conformations.
Polymers (Basel). 2023 Apr 22;15(9):1988. doi: 10.3390/polym15091988.
Polymers (Basel). 2023.
PMID: 37177136
Free PMC article.
Molecular Modeling of EUV Photoresist Revealing the Effect of Chain Conformation on Line-Edge Roughness Formation.
Park J, Lee SG, Vesters Y, Severi J, Kim M, De Simone D, Oh HK, Hur SM.
Park J, et al. Among authors: oh hk.
Polymers (Basel). 2019 Nov 22;11(12):1923. doi: 10.3390/polym11121923.
Polymers (Basel). 2019.
PMID: 31766636
Free PMC article.
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A technique for the non-destructive EUV mask sidewall angle measurement using scanning electron microscope.
Lee S, Lee J, Ban S, Oh HK, Nam B, Kim S, Yim D, Kim O.
Lee S, et al. Among authors: oh hk.
J Nanosci Nanotechnol. 2013 Dec;13(12):8032-5. doi: 10.1166/jnn.2013.8170.
J Nanosci Nanotechnol. 2013.
PMID: 24266186
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Advanced lithography simulation for various 3-dimensional nano/microstructuring fabrications in positive- and negative-tone photoresists.
Kim SK, Oh HK, Jung YD, An I.
Kim SK, et al. Among authors: oh hk.
J Nanosci Nanotechnol. 2011 Jan;11(1):528-32. doi: 10.1166/jnn.2011.3288.
J Nanosci Nanotechnol. 2011.
PMID: 21446490
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