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Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography.
Borah D, Cummins C, Rasappa S, Senthamaraikannan R, Salaun M, Zelsmann M, Liontos G, Ntetsikas K, Avgeropoulos A, Morris MA. Borah D, et al. Among authors: liontos g. Nanomaterials (Basel). 2018 Jan 9;8(1):32. doi: 10.3390/nano8010032. Nanomaterials (Basel). 2018. PMID: 29315245 Free PMC article.
Nanoscale silicon substrate patterns from self-assembly of cylinder forming poly(styrene)-block-poly(dimethylsiloxane) block copolymer on silane functionalized surfaces.
Borah D, Cummins C, Rasappa S, Watson SM, Pike AR, Horrocks BR, Fulton DA, Houlton A, Liontos G, Ntetsikas K, Avgeropoulos A, Morris MA. Borah D, et al. Among authors: liontos g. Nanotechnology. 2017 Jan 27;28(4):044001. doi: 10.1088/1361-6528/28/4/044001. Epub 2016 Dec 16. Nanotechnology. 2017. PMID: 27981945