The study was devoted to the creation of transparent electrodes based on highly conductive mesh structures. The analysis and reasonable choice of technological approaches to the production of such materials with a high Q factor (the ratio of transparency and electrical conductivity) were carried out. The developed manufacturing technology consists of the formation of grooves in a transparent substrate by photolithography methods, followed by reactive ion plasma etching and their metallization by chemical deposition using the silver mirror reaction. Experimental samples of a transparent electrode fabricated using this technology have a sheet resistance of about 0.1 Ω/sq with a light transmittance in the visible wavelength range of more than 60%.
Keywords: chemical deposition; groove; lithography; mesh structure; sheet resistance; shielding efficiency; transparency; transparent electrode.