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Page 1
SIMS Analysis of Thin EUV Photoresist Films.
Anal Chem. 2022 Feb 8;94(5):2408-2415. doi: 10.1021/acs.analchem.1c04012. Epub 2022 Jan 25.
Anal Chem. 2022.
PMID: 35076209
Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography.
Rathore A , Cipriani M , Huang CC , Amiaud L , Dablemont C , Lafosse A , Ingólfsson O , De Simone D , De Gendt S .
Rathore A , et al. Among authors: de simone d.
Phys Chem Chem Phys. 2021 Apr 22;23(15):9228-9234. doi: 10.1039/d1cp00065a.
Phys Chem Chem Phys. 2021.
PMID: 33885061
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Mean Free Path of Electrons in Organic Photoresists for Extreme Ultraviolet Lithography in the Kinetic Energy Range 20-450 eV.
Fallica R, Mahne N, Conard T, Vanleenhove A, de Simone D, Nannarone S.
Fallica R, et al. Among authors: de simone d.
ACS Appl Mater Interfaces. 2023 Jul 26;15(29):35483-35494. doi: 10.1021/acsami.3c05884. Epub 2023 Jul 14.
ACS Appl Mater Interfaces. 2023.
PMID: 37449783
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Dielectric Response Spectroscopy as Means to Investigate Interfacial Effects for Ultra-Thin Film Polymer-Based High NA EUV Lithography.
Severi J, De Simone D, De Gendt S.
Severi J, et al. Among authors: de simone d.
Polymers (Basel). 2020 Dec 12;12(12):2971. doi: 10.3390/polym12122971.
Polymers (Basel). 2020.
PMID: 33322737
Free PMC article.
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Molecular Modeling of EUV Photoresist Revealing the Effect of Chain Conformation on Line-Edge Roughness Formation.
Park J, Lee SG, Vesters Y, Severi J, Kim M, De Simone D, Oh HK, Hur SM.
Park J, et al. Among authors: de simone d.
Polymers (Basel). 2019 Nov 22;11(12):1923. doi: 10.3390/polym11121923.
Polymers (Basel). 2019.
PMID: 31766636
Free PMC article.
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