Electrothermally-Actuated Micromirrors with Bimorph Actuators--Bending-Type and Torsion-Type

Cheng-Hua Tsai; Chun-Wei Tsai; Hsu-Tang Chang; Shih-Hsiang Liu; Jui-Che Tsai

doi:10.3390/s150614745

Electrothermally-Actuated Micromirrors with Bimorph Actuators--Bending-Type and Torsion-Type

Sensors (Basel). 2015 Jun 22;15(6):14745-56. doi: 10.3390/s150614745.

Authors

Cheng-Hua Tsai¹, Chun-Wei Tsai¹, Hsu-Tang Chang², Shih-Hsiang Liu³, Jui-Che Tsai⁴

Affiliations

¹ Graduate Institute of Photonics and Optoelectronics and the Department of Electrical Engineering, National Taiwan University, Taipei 10617, Taiwan. d98941019@ntu.edu.tw.
² Graduate Institute of Photonics and Optoelectronics and the Department of Electrical Engineering, National Taiwan University, Taipei 10617, Taiwan. ckjamesbond@gmail.com.
³ Graduate Institute of Photonics and Optoelectronics and the Department of Electrical Engineering, National Taiwan University, Taipei 10617, Taiwan. r01941068@ntu.edu.tw.
⁴ Graduate Institute of Photonics and Optoelectronics and the Department of Electrical Engineering, National Taiwan University, Taipei 10617, Taiwan. juichetsai@ntu.edu.tw.

Abstract

Three different electrothermally-actuated MEMS micromirrors with Cr/Au-Si bimorph actuators are proposed. The devices are fabricated with the SOIMUMPs process developed by MEMSCAP, Inc. (Durham, NC, USA). A silicon-on-insulator MEMS process has been employed for the fabrication of these micromirrors. Electrothermal actuation has achieved a large angular movement in the micromirrors. Application of an external electric current 0.04 A to the bending-type, restricted-torsion-type, and free-torsion-type mirrors achieved rotation angles of 1.69°, 3.28°, and 3.64°, respectively.

Keywords: electrothermal effects; microelectromechanical devices; silicon on insulator.

Publication types

Research Support, Non-U.S. Gov't

MeSH terms

Equipment Design
Hot Temperature
Micro-Electrical-Mechanical Systems / instrumentation*
Silicon

Substances

Silicon