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Tunneling Atomic Layer-Deposited Aluminum Oxide: a Correlated Structural/Electrical Performance Study for the Surface Passivation of Silicon Junctions.
Nanoscale Res Lett. 2019 Oct 22;14(1):330. doi: 10.1186/s11671-019-3160-2.
Nanoscale Res Lett. 2019.
PMID: 31641871
Free PMC article.
Local Schottky contacts of embedded Ag nanoparticles in Al2O3/SiN x :H stacks on Si: a design to enhance field effect passivation of Si junctions.
Elmi OI, Cristini-Robbe O, Chen MY, Wei B, Bernard R, Yarekha D, Okada E, Ouendi S, Portier X, Gourbilleau F, Xu T, Stiévenard D.
Elmi OI, et al. Among authors: cristini robbe o.
Nanotechnology. 2018 Jul 13;29(28):285403. doi: 10.1088/1361-6528/aac032. Epub 2018 Apr 26.
Nanotechnology. 2018.
PMID: 29697055
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