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Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask.
Lin D, Liu Z, Dietrich K, Sokolov A, Sertsu MG, Zhou H, Huo T, Kroker S, Chen H, Qiu K, Xu X, Schäfers F, Liu Y, Kley EB, Hong Y. Lin D, et al. Among authors: schafers f. J Synchrotron Radiat. 2019 Sep 1;26(Pt 5):1782-1789. doi: 10.1107/S1600577519008245. Epub 2019 Aug 16. J Synchrotron Radiat. 2019. PMID: 31490170 Free PMC article.
Efficient high-order suppression system for a metrology beamline.
Sokolov A, Sertsu MG, Gaupp A, Lüttecke M, Schäfers F. Sokolov A, et al. Among authors: schafers f. J Synchrotron Radiat. 2018 Jan 1;25(Pt 1):100-107. doi: 10.1107/S1600577517016800. Epub 2018 Jan 1. J Synchrotron Radiat. 2018. PMID: 29271758 Free PMC article.
Gratings for synchrotron and FEL beamlines: a project for the manufacture of ultra-precise gratings at Helmholtz Zentrum Berlin.
Siewert F, Löchel B, Buchheim J, Eggenstein F, Firsov A, Gwalt G, Kutz O, Lemke S, Nelles B, Rudolph I, Schäfers F, Seliger T, Senf F, Sokolov A, Waberski C, Wolf J, Zeschke T, Zizak I, Follath R, Arnold T, Frost F, Pietag F, Erko A. Siewert F, et al. Among authors: schafers f. J Synchrotron Radiat. 2018 Jan 1;25(Pt 1):91-99. doi: 10.1107/S1600577517015600. Epub 2018 Jan 1. J Synchrotron Radiat. 2018. PMID: 29271757 Free PMC article.
Soft x-ray reflectometry, hard x-ray photoelectron spectroscopy and transmission electron microscopy investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks.
Filatova EO, Kozhevnikov IV, Sokolov AA, Ubyivovk EV, Yulin S, Gorgoi M, Schäfers F. Filatova EO, et al. Among authors: schafers f. Sci Technol Adv Mater. 2012 Feb 2;13(1):015001. doi: 10.1088/1468-6996/13/1/015001. eCollection 2012 Feb. Sci Technol Adv Mater. 2012. PMID: 27877468 Free PMC article.
At-wavelength metrology facility for soft X-ray reflection optics.
Sokolov A, Bischoff P, Eggenstein F, Erko A, Gaupp A, Künstner S, Mast M, Schmidt JS, Senf F, Siewert F, Zeschke T, Schäfers F. Sokolov A, et al. Among authors: schafers f. Rev Sci Instrum. 2016 May;87(5):052005. doi: 10.1063/1.4950731. Rev Sci Instrum. 2016. PMID: 27250385
High-reflection Mo/Be/Si multilayers for EUV lithography.
Chkhalo NI, Gusev SA, Nechay AN, Pariev DE, Polkovnikov VN, Salashchenko NN, Schäfers F, Sertsu MG, Sokolov A, Svechnikov MV, Tatarsky DA. Chkhalo NI, et al. Among authors: schafers f. Opt Lett. 2017 Dec 15;42(24):5070-5073. doi: 10.1364/OL.42.005070. Opt Lett. 2017. PMID: 29240139
57 results